The RITM-SP facility
Microsplav OOO in collaboration with the Institute of High-Current Electronics SB RAS has introduced into service a combined laboratory facility for the forming of surface alloys “RITM-SP”.
This facility involves source of electron beams “RITM” equipped with the two magnetron sputtering systems disposed on the same vacuum chamber. The facility allows depositing of nanofilms on the required article or part followed by a liquid-phase mixing the layer deposited and the substrate by means of intensive pulsed electron beam. The thicknesses of formed surface alloys vary from tenths to tens of micron.
Schematic of operation of the facility looks like the following: